Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching
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- Citation
- Albert, J, Hill, K.O. (K. O.), Malo, B. (B.), Johnson, D.C. (D. C.), Bilodeau, F. (F.), Templeton, I.M. (I. M.), & Brebner, J.L. (J. L.). (1993). Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching. Applied Physics Letters, 63(17), 2309–2311. doi:10.1063/1.110509
- Date Created
- 1993-12-01
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