Compact SOI Polarization Rotators Based on Asymmetric Periodic Loaded WaveguidesPublic Deposited
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Silicon-on-insulator (SOI) technology is a promising platform for photonic applications with low-cost and large volume production due to its compatibility with the complementary metal-oxide semiconductor (CMOS) process. However, the high index-contrast between silicon and the top cladding (SiO2 or air) of the SOI waveguides leads to considerable modal birefringence. Consequently, SOI based PICs are in general highly polarization-sensitive, making polarization management a necessity. In this thesis, two polarization rotator (PR) designs on the 220 nm SOI platform are demonstrated through numerical simulations and experiments. The demonstrated PR designs are based on asymmetrical periodic loaded waveguide structures. The demonstrated designs feature compact device footprint and can be fabricated by CMOS compactable process. Both designs have shown promising performance over the C-band wavelengths by simulations. However, the fabrication requirements are stringent for these two designs, thus the performance of the fabricated devices are limited by the current fabrication technology.
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- Copyright © 2016 the author(s). Theses may be used for non-commercial research, educational, or related academic purposes only. Such uses include personal study, research, scholarship, and teaching. Theses may only be shared by linking to Carleton University Institutional Repository and no part may be used without proper attribution to the author. No part may be used for commercial purposes directly or indirectly via a for-profit platform; no adaptation or derivative works are permitted without consent from the copyright owner.
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