A variable diffraction efficiency phase mask is produced by focused ion beam, implanting a grating pattern into a fused SiO
2 substrate with a 100-nm-diam, 200keV Si beam. The substrate is prepared by cleaning and coating with a 20-nm-thick film of Al to dissipate the ion charge. The pattern consists of 930 lines, each 80μm long, at a pitch of 1.075μm, to obtain a 1-mm-long grating. The substrate is wet etched in a 1M% HF solution for about 45min to produce a phase mask with the desired diffraction efficiency. This phase mask is used to photoimprint Bragg gratings into standard hydrogenated single-mode telecommunication fibers using 193nm light from an ArF laser.
An apodized in-fibre Bragg grating reflector is fabricated using the phase mask photoimprinting technique. The reflector has a centre wavelength of 1550 nm, a bandwidth of 0.22 nm and a peak reflectivity of 90%. At 0.4 nm (50 GHz) from the centre wavelength the reflectivity is 40 dB lower than the peak reflectivity; this is an improvement of more than 20 dB over an unapodized Bragg grating reflector with similar bandwidth and peak reflectivity.
An apodized chirped in-fibre Bragg grating that has a linear dispersion characteristic is reported. The frequency components of an optical pulse (centre wavelength 1551 nm; 10 GHz bandwidth) incident on the grating are reflected with a relative delay that varies linearly from 0 to 130 ps across the spectral width of the pulse. The dispersion compensator is used to correct for the dispersion in a 100 km link (nondispersion shifted fibre) operating at a 10 Gbit/s transmission rate and a wavelength of 1551 nm.
The core refractive index of Corning SMF-28 optical fibre exposed to ArF laser pulses increases with the square of the fluence per pulse. Bragg gratings with a refractive index modulation amplitude higher than 10
-3 have been obtained. This is an order of magnitude improvement over previously reported values for this type of fibre in the absence of treatment to enhance the photosensitivity.
Single-longitudinal-mode operation of Er3+-P2O5-codoped silica planar waveguide lasers which are equipped with integrated Bragg grating reflectors is demonstrated, with a polarized output of 340 μW at 1546 nm. The gratings are photo-imprinted using 193 nm light exposure through a phase mask in GeO2-free optical waveguides that have been sensitized by H2 loading.