Index Catalog // Carleton University Institutional Repository

Resource Type:: Article
Creator:: Johnson, D. C., Malo, B., Hill, K. O., Thériault, S., Bilodeau, F., and Albert, Jacques
Date Created:: 1995-12-01

Resource Type:: Article
Creator:: Hill, K. O., Albert, Jacques, Bilodeau, F., Johnson, D. C., Malo, B., and Theriault, S.
Abstract:: The core refractive index of Corning SMF-28 optical fibre exposed to ArF laser pulses increases with the square of the fluence per pulse. Bragg gratings with a refractive index modulation amplitude higher than 10 -3 have been obtained. This is an order of magnitude improvement over previously reported values for this type of fibre in the absence of treatment to enhance the photosensitivity.
Date Created:: 1995-05-25

Resource Type:: Article
Creator:: Johnson, D. C., Theriault, S., Malo, B., Bilodeau, F., Hill, K. O., and Albert, Jacques
Abstract:: An apodized in-fibre Bragg grating reflector is fabricated using the phase mask photoimprinting technique. The reflector has a centre wavelength of 1550 nm, a bandwidth of 0.22 nm and a peak reflectivity of 90%. At 0.4 nm (50 GHz) from the centre wavelength the reflectivity is 40 dB lower than the peak reflectivity; this is an improvement of more than 20 dB over an unapodized Bragg grating reflector with similar bandwidth and peak reflectivity.
Date Created:: 1995-02-02

Resource Type:: Article
Creator:: Johnson, D. C., Champion, H. G., Erickson, L. E., Hill, K. O., Malo, B., Theriault, S., Bilodeau, F., and Albert, Jacques
Abstract:: A variable diffraction efficiency phase mask is produced by focused ion beam, implanting a grating pattern into a fused SiO 2 substrate with a 100-nm-diam, 200keV Si beam. The substrate is prepared by cleaning and coating with a 20-nm-thick film of Al to dissipate the ion charge. The pattern consists of 930 lines, each 80μm long, at a pitch of 1.075μm, to obtain a 1-mm-long grating. The substrate is wet etched in a 1M% HF solution for about 45min to produce a phase mask with the desired diffraction efficiency. This phase mask is used to photoimprint Bragg gratings into standard hydrogenated single-mode telecommunication fibers using 193nm light from an ArF laser.
Date Created:: 1995-11-01

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